Naxau Vacuum Coating Processing - Naxau AM
Industrial Upgrading Equipment First
Intelligent leadership in industrial upgrading
P Series DLC Vacuum Coating Machine
product & project
The Naxau P-Series PVD Vacuum Deposition Systems are designed on the Naxau SPARK platform, which features the key technologies of CVC (Continuously Variable Cathode) and UFC (Ultra Fine Cathode) arc cathodes.
Highly flexible and one of the most reliable production outputs in the industry. Multiple plasma technologies can be compounded on one machine.
- Based on APC arc technology
- SET etching technology
- Higher plating rate for multilayer nanocomposite structure coatings
P Standard SeriesDLC Vacuum Coating Equipment
| P850 | P1200 | P1600 | |
| Effective size of plasma [mm] | D680x850 | D680x1200 | D800x1600 |
| Load capacity [kg] | 500 | 800 | 1200 |
| PVD technology | CFS ® , PECVD | CFS ® , PECVD | CFS ® , PECVD |
| Etching technology | SET® | SET® | SET® |
| Number of cathodes | 4 | 4 | 6 |
| Coating time [h] | 10-12h | 10-12h | 10-12h |
| Coating hardness [hv] | 1200-2500 | 1200-2500 | 1200-2500 |
| Roughness Ra[um] | <0.05 | <0.05 | <0.05 |
| Binding force - scratch[N] | >30, >20 | >30, >20 | >30, >20 |
| Coating type | Cr+W-C:H+a-C:H, Cr+WC-C:H, GLC, Al-Sn-Cu, MoS2, etc. | Cr+W-C:H+a-C:H, Cr+WC-C:H, GLC, Al-Sn-Cu, MoS2 | Cr+W-C:H+a-C:H, Cr+WC-C:H, GLC, Al-Sn-Cu, MoS2 |
| Footprint D*W*H (mm) | 4600x2300x2000 | 4600x2300x2300 | 4600x2300x2500 |
The configuration of SET plasma enhancement technology facilitates the dissociation of carbon source gases such as C2H2, CH4, etc., and the preparation of low friction coefficient, higher hardness, low a-C:H, a-C:Si DLC coatings and WCC coatings.
Specificities
- 4 magnetron sputtering cathodes for the preparation of nitride and carbide films
- Non-equilibrium closed magnetic field can be configured. High-density, low-energy bombardment ions are used for deposition coating, with good coating density, low columnar crystal structure and low internal stress.
- Ion Beam Enhanced PECVD Technology for Carbon Films with Faster Deposition Rates
- Vertical loading, more convenient product loading
- High Performance UBM Sputtering Sources
- Filament argon ion etching source
- Turbomolecular pump*2
hardware
- PC Intelligent Systems Germany
- Touch screen control
- Data logging and real-time display of process parameters and flows
- Automatic process control
- Remote diagnostics and maintenance
- Access to digital management systems
Highly customizable DLC membrane system - adjustable parameters
The hardest substance in nature is diamond (sp3 bond), while graphite (sp2 bond) is one of the softest substances.DLC is a diamond-like amorphous carbon substrate mixed with sp3 and sp2 bonds.The more SP3 bonds, the harder the DLC, and the opposite, the softer it is.DLC coatings are usually used for high hardness and self-lubrication, corrosion resistance, insulation, light absorption and other working conditions. In order to realize more diversified functional requirements, doping with other elements such as Si, F, B, W, Ta, etc. can realize various purposes such as super lubrication, high temperature resistance, anti-adhesion and stress reduction.
P Series Sputter Coaterapplication program
Injection Screw - Injection Mold Coating- Coating ProgramsChromium Nitride | Titanium Mirror Nitride | DLC | Aluminum Titanium
Non-precious metal coating for fuel cell bipolar plates- Industry ApplicationsHydrogen Energy | Hydrogen Storage | Bipolar Plates | Precious Metal Substitution
DLC diamond-like coatings- Coating ProgramsDLC | ta-C Ultra Hard | WcC | Super Lubrication | Wear Resistant Decorative Plating
Plastic molds- Industry Applications Stamping Mold | Plastic Molds | Die Casting Molds | Stretch Molds
loading...
It's already to the last piece of content!
Dual-etching technology for dramatically improved bonding::
Based on more than 20 years of continuous operation and improvement, Naxau has developed a plasma etching technology SET and CET. Proper etching of the tool surface to achieve a clean and revitalized interface prior to coating is critical to a successful coating result. Etching requires the removal of surface contaminants such as metal oxides, water vapor, micro-oils and sweat debris. Etching also reactivates the surface and opens up molecular chains to induce ionic bonding during the coating process.
turnkey project
turnkey project
One-stop shop for vacuum coating equipment, coating process, peripheral production equipment suggestions, personnel training, plant planning, and other complete coating plant mass production program.
Naxau vacuum coating equipment is one of the industry's most reliable production outputs. Multiple plasma deposition technologies can be compounded on a single machine.
