Magnetron sputtering - dual magnetron and intermediate frequency magnetron sputtering

2019-02-13 2790

High deposition rates and target utilization are important for industrial processes. Although the deposition rates for magnetron cathodes are relatively high, they are not as high as those for evaporation processes (addressed in previous blogs). Dual magnetron/pulsed magnetron configurations can achieve both high deposition rates and improved material utilization [1,2,3]. Dual magnetron sputtering uses mid-frequency (~40 kHz - 300 kHz) pulsed electric...

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